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Zhang, Z,*; Wang, H.*; Yoshikawa, Hirofumi*; Matsumura, Daiju; Hatao, Shuya*; Ishikawa, Satoshi*; Ueda, Wataru*
ACS Applied Materials & Interfaces, 12(5), p.6056 - 6063, 2020/02
Times Cited Count:6 Percentile:30.33(Nanoscience & Nanotechnology)Wang, H.*; Idobe, Jin*; Shimizu, Takeshi*; Matsumura, Daiju; Ina, Toshiaki*; Yoshikawa, Hirofumi*
Journal of Power Sources, 360, p.150 - 156, 2017/08
Times Cited Count:13 Percentile:43.49(Chemistry, Physical)